The low-pressure vacuum plasma equipment is a high-precision device that generates plasma from process gases via radio frequency (RF)/microwave excitation in a vacuum environment of 10⁻³–10¹ Pa, performing atomic-level cleaning and activation on material surfaces. Composed of five core systems including the vacuum system and gas supply system, it features high precision, excellent uniformity, pollution-free processing and broad substrate compatibility. Widely used in high-end manufacturing fields such as semiconductors and medical devices, it serves as a critical piece of equipment for improving material surface properties and ensuring the quality of precision products.