The microwave plasma cleaner is a device that generates plasma by exciting process gases with 2.45 GHz microwaves, performing high-precision surface cleaning and activation on materials under either vacuum or atmospheric pressure conditions. Composed of core systems including a microwave source and gas supply system, it features high plasma density, electrode-free contamination, and low-temperature processing capabilities. Widely used in high-end fields such as semiconductors, precision electronics and medical devices, it serves as a core piece of equipment for surface treatment in stringent application scenarios.