Functional Inorganic Film-Suzhou Aptel Electronics Technology

Plasma Cleaner

Low Pressure Plasma System Atmospheric Plasma System Microwave Plasma Cleaner LED Packaging Plasma Cleaner Plasma Stripper Plasma Etching System

Adhesive

Epoxy Silicone Series PU Acrylate Silanization

Thermal Interface Material

Thermal Pad Thermal Conductive Gel Thermal Grease Thermal Conductive Insulator Phase Change Material Thermal And Wave Absorption Material EMI Shielding Material Thermal Potting Adhesive

Lubricant

Lubricating Oil Lubricating Grease Dry Film Lubricant

Cleaning Agent

Water-Based Cleaning Agent Semi-Aqueous Cleaning Agent Oil-Based Cleaning Agent Solvent Cleaning Agent

Release Agent

Rubber Composite PU Internal Release Agent Metal Die Casting Emerging Industry

Nanocoating

Organic Protective Film Organic Hydrophobic Film Functional Inorganic Film Functional Olefinic Carbon Film

Dispensing Equipment

Single-Component Dispensing System Two-Component Metering and Mixing System

Product Details

Core Positioning：A nanoscale (10–1000 nm) functional film fabricated from inorganic materials. It adheres to substrate surfaces via deposition/coating technologies, serving as an industrial protective and functional modification material featuring high temperature resistance, high hardness and strong stability.
Components：Inorganic substrates (e.g., SiO₂, TiO₂, Al₂O₃, silicon nitride, titanium carbide, etc.). Some formulations incorporate nanoscale functional fillers (e.g., antibacterial ions, UV-resistant particles). Free of organic polymer components.
Core Principles：Leveraging the high chemical stability, physical rigidity of inorganic materials and the dense barrier properties of nanostructures, it forms a uniform protective layer on substrate surfaces. This enables targeted functions including wear resistance, corrosion resistance, high temperature resistance, antibacterial activity, UV resistance and high light transmittance. Some variants achieve self-cleaning effects through photocatalysis (e.g., TiO₂-based films).
Typical Applications：Semiconductor chips/electronic components (insulation/high temperature resistance); photovoltaic modules (UV resistance/wear resistance); aerospace components (high temperature resistance/corrosion resistance); high-end hardware parts (wear resistance/corrosion resistance); medical devices (antibacterial property/disinfestation resistance); glass products (high light transmittance/wear resistance); high-temperature components of industrial equipment (high temperature protection).
Advantages：Excellent high temperature resistance (temperature range from -100℃ to 800℃+, far exceeding organic films); high hardness (Mohs hardness ≥6, scratch and wear resistant); strong chemical stability (acid, alkali and organic solvent resistant); VOC-free and eco-friendly; long service life. Additionally, some variants have special functions such as high light transmittance and antibacterial activity.
Key Parameters：Thickness (adjustable from 10–1000 nm); hardness (Mohs hardness 6–9); temperature resistance range (-100℃~800℃+); corrosion resistance (resistant to acid and alkali immersion for ≥100 hours); light transmittance (≥90% for optical-grade products); wear resistance cycles (≥10000 cycles).