Microwave plasma cleaning equipment has become key equipment in the manufacturing of optoelectronic, semiconductor and defense electronic equipment thanks to its advantages of high efficiency, non-damage, environmental friendliness and easy maintenance. It is mainly used for photoresist removal in front-end semiconductor processes, cleaning in back-end chip packaging, as well as the preparation of new semiconductor devices such as gallium arsenide, gallium nitride and silicon carbide. It can significantly improve product reliability and yield, is widely applied in military high-reliability components and high-end electronic manufacturing, and promotes technological development in the electronics industry.

Plasma technology, acting as the "performance multiplier" for energy storage materials, is widely applied in various fields including all types of energy storage batteries, supercapacitors and fusion energy storage. It can precisely break through the performance bottlenecks of traditional energy storage materials and drive the upgrading of energy storage technology, has gradually moved toward industrialization, and boasts broad development prospects under the guidance of the dual carbon goals.

Low-temperature plasma can precisely modify the surface physicochemical properties of materials without altering their internal properties, achieving effects such as enhanced hydrophilicity, improved adhesion and optimized biocompatibility. It boasts the advantages of being clean, efficient and environmentally friendly, and thus has broad application prospects in various industries.